美利体育登录入口官网

表面化学分析．次级离子质谱测量法．硅中注入硼的深度分布分析法

Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon

表面化学分析 次级离子质谱法 植入离子的参考材料的相对灵敏系数的测定

Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials

表面化学分析．俄歇电子能谱法和X射线光电子光谱法．均质材料定量分析中实验测定的相对灵敏系数使用指南

Surface chemical analysis - Auger electron spectroscopy and X-ray photoelectron spectroscopy - Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials

应用高质量分辩率辉光放电质谱计测定电子级铝中微量金属杂质的标准试验方法

Standard Test Method for Trace Metallic Impurities in Electronic Grade Aluminum by High Mass-Resolution Glow-Discharge Mass Spectrometer

使用高质量分辨率辉光放电质谱仪测定电子级铝中痕量金属杂质的标准试验方法

Standard Test Method for Trace Metallic Impurities in Electronic Grade Aluminum by High Mass-Resolution Glow-Discharge Mass Spectrometer

使用高质量分辨率辉光放电质谱仪测定电子级钛中痕量金属杂质的标准试验方法

Standard Test Method for Trace Metallic Impurities in Electronic Grade Titanium by High Mass-Resolution Glow Discharge Mass Spectrometer

采用高质量分辨率辉光放电质谱仪测定电子级铝铜, 铝硅和铝铜硅合金中的痕量金属杂质的标准试验方法

Standard Test Method for Trace Metallic Impurities in Electronic Grade Aluminum-Copper, Aluminum-Silicon, and Aluminum-Copper-Silicon Alloys by High-Mass-Resolution Glow Discharge Mass Spectrometer

表面化学分析.辉光放电质谱法(GD-MS).用法介绍

Surface chemical analysis - Glow discharge Mass spectrometry (GD-MS) - Introduction to use

表面化学分析 二次离子质谱 离子注入参考材料的相对灵敏度因子的测定

Surface chemical analysis. Secondary-ion mass spectrometry. Determination of relative sensitivity factors from ion-implanted reference materials

表面化学分析 俄歇电子能谱和X射线光电子能谱 使用实验确定的相对灵敏度因子进行均质材料定量分析的指南

Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials

表面化学分析 俄歇电子能谱和X射线光电子能谱 使用实验确定的相对灵敏度因子进行均质材料定量分析的指南

Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials

表面化学分析.二次离子质谱.由离子注入参考物质确定相对灵敏度因子

Surface chemical analysis.Secondary-ion mass spectrometry.Determination of relative sensitivity factors from ion-implanted reference materials

表面化学分析 俄歇电子能谱和X射线光电子能谱 实验测定的相对灵敏度因子在均匀材料定量分析中的使用指南

Surface chemical analysis.Auger electron spectroscopy and X-ray photoelectron spectroscopy.Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials

表面化学分析 电子能谱和X射线光电子能谱 使用指南 用于实验确定均匀材料定量分析的相对灵敏度因子...

Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy — Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials

表面化学分析.二次离子质谱分析法.硅中砷的深度剖析法

Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of arsenic in silicon

表面化学分析.次级离子质谱法.测定离子注入标样中的相对灵敏度系数

Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials

表面化学分析.俄歇电子光谱法和X射线光电子光谱法.同质材料定量分析用实验室测定相对敏感性因子的使用指南

Surface chemical analysis - Auger electron spectroscopy and X-ray photoelectron spectroscopy - Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials

表面化学分析.俄歇电子光谱法和X射线光电子光谱法.同质材料定量分析用实验室测定相对敏感性因子的使用指南

Surface chemical analysis - Auger electron spectroscopy and X-ray photoelectron spectroscopy - Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials

表面化学分析俄歇电子能谱和X射线光电子能谱均匀材料定量分析用实验确定的相对灵敏度因子的使用指南

Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy — Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis

表面化学分析.X射线光电子能谱学.均匀材料中元素美利体育登录入口官网极限的估算和报告

Surface chemical analysis — X-ray photoelectron spectroscopy — Estimating and reporting detection limits for elements in homogeneous materials

表面化学分析.辉光放电质谱测定法(GD-MS).使用介绍

Surface chemical analysis - Glow discharge mass spectrometry (GD-MS) - Introduction to use

高纯钌化学分析方法 杂质元素含量的测定 辉光放电质谱法

Chemical analysis method of high purity ruthenium Determination of impurity element content Glow discharge mass spectrometry

高纯铅化学分析方法 第4部分:痕量杂质元素含量的测定 辉光放电质谱法

Chemical analysis methods for high purity lead.Part 4:Determination of trace impurity elements content.Glow discharge mass spectrometry

高纯锑化学分析方法 镁、锌、镍、铜、银、镉、铁、硫、砷、金、锰、铅、铋、硅、硒含量的测定 高质量分辨率辉光放电质谱法

Method for chemical analysis of high purity antimony.Determination of magnesium,zinc,nickel,copper,silver,cadium,iron,sulfur,arsenic,gold,manganese,lead,bismuth,silicon,selenium.High-mass resolution glow discharge mass spectrometry

高纯镉化学分析方法 痕量杂质元素含量的测定 辉光放电质谱法

Chemical analysis methods for high purity cadmium.Determination of trace impurity elements content.Glow discharge mass spectrometry

高纯铋化学分析方法 第2部分：痕量杂质元素含量的测定 辉光放电质谱法

Methods for chemical analysis of high purity bismuth—Part 2： Determination of trace impurity elements contents—Glow discharge mass spectrometry

高纯铟化学分析方法 第1部分：痕量杂质元素含量的测定 辉光放电质谱法

Methods for chemical analysis of high purity indium—Part 1: Determination of trace impurity elements content—Glow discharge mass spectrometry