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表面化学分析．次级离子质谱测量法．使用均一的绝缘材料测定硅中的硼原子浓度

Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials

二次离子质谱法（SIMS）中溅射深度剖面数据报告的标准实施规程

Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)

表面化学分析.二次离子质谱分析法.硅中砷的深度剖析法

Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of arsenic in silicon

表面化学分析.二次离子质谱.用均匀掺杂物质测定硅中硼的原子浓度

Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials

表面化学分析 二次离子质谱 离子注入参考材料的相对灵敏度因子的测定

Surface chemical analysis. Secondary-ion mass spectrometry. Determination of relative sensitivity factors from ion-implanted reference materials

硅和外延片表面Na、Al、K和Fe的二次离子质谱美利体育登录入口官网方法

Test method for measuring surface sodium, aluminum, potassium, and iron on silicon and epi substrates by secondary ion mass spectrometry

表面化学分析.二次离子质谱.用均匀掺杂物质测定硅中硼的原子浓度

Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials

金刚石膜中硼掺杂含量的测定 二次离子质谱法

Determination of boron doping content in diamond film—Secondary ion mass spectrometry

表面化学分析.次级离子质谱法.利用均匀掺杂材料测定硅中硼原子浓度

Surface chemical analysis -- Secondary ion mass spectrometry -- Determination of boron atomic concentration in silicon using uniformly doped materials

表面化学分析 二次离子质谱 单离子计数飞行时间质谱仪中强度标尺的线性度

Surface chemical analysis-Secondary ion mass spectrometry-Linearity of intensity scale in single ion counting time-of-flight mass analysers

硅衬底中氮浓度的二次离子质谱测量方法

Test method for measuring nitrogen concentration in silicon substrates by secondary ion mass spectrometry

重掺硅衬底中氧浓度的二次离子质谱测量方法

Test method for measuring oxygen contamination in heavily doped silicon substrates by secondary ion mass spectrometry