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物理气相沉积涂层 – 磁控溅射沉积TiAlSiN薄膜 – 规范

Physical vapor deposition coatings — Magnetron sputtering deposition of TiAlSiN thin films — Specification

工业用X射线管空白详细规范

Blank detail specification of X-ray tubes for industry

金及金合金靶材

Gold and Gold Alloy Targets

无损美利体育登录入口官网仪器 X射线荧光分析管

Non-destructive testing instruments—X-ray fluorescence analysis tube

靶材与背板结合强度测试方法

Test methods of the bonding strength for target-backing plate assemblies

工业无损美利体育登录入口官网美利体育官网首页网址. 电子直线加速器

Industrial non-destructive testing equipment - Electron linear accelerator

钪铝合金靶材

Scandium aluminum alloy target

电子薄膜用高纯钴靶材

High-purity cobalt sputtering target used in electronic film

铬钼合金（CrMo）靶材

Chromium Molybdenum Alloy (CrMo) target material

钼钛合金（MoTi）靶材

Molybdenum titanium alloy (MoTi) target material

磁记录用铬钽钛合金溅射靶材

Chromium-tantalum-titanium alloy sputtering target for magnetic recording

热敏打印用碳-碳化硅靶材

Carbon-silicon carbide target for thermal printing

高纯钛铝合金靶材

High-purity titanium aluminum alloy target

电子薄膜用高纯钛溅射靶材

High-purity sputtering titanium target used in electronic film

电子薄膜用高纯金属溅射靶材纯度等级及杂质含量分析和报告标准指南

Standard guide for analysis and reporting the impurity content and grade of high purity metallic sputtering targets for electronic thin film applications